Plasmalab System 100 Manual

PlasmaLab 100 PECVD Author: Raj Patel, Meredith Metzler Page 1 1. Introduction This report documents the study of deposition characteristics and film properties of silicon dioxide (SiO 2) thin films deposited by plasma enhanced chemical vapor deposition (PECVD) using Oxford PlasmaLab 100 system. Deposition rate, thickness non-uniformity.

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